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Molecular Formula: C3H9Al
Appearance: Colorless liquid
Molecular Weight: 72.09
Melting Point: 15 °C
Boiling Point: 126 °C
Density: 0.81 g/mL at 25 °C
Vapour Pressure: 69.3 mmHg ( 60 °C)
Solubility: Soluble in aromatic hydrocarbons, saturated aliphatic hydrocarbons, alicyclic hydrocarbons, and organic solvents such as ether
Storage Conditions: 0-6°C
Wolfa offers trimethylaluminium with purity up to 99%. This rigorously purified compound contains extremely low levels of metallic impurities, ensuring reliability in high-end semiconductor applications.
Its high reactivity enables many difficult chemical transformations under mild conditions, providing a powerful tool for the synthesis of pharmaceuticals and specialty chemicals.
TMA's highly self-limiting reaction with oxygen-containing sources such as water and ozone makes it the "gold standard" precursor for depositing aluminum oxide thin films using ALD technology. It reacts rapidly, producing films with excellent uniformity, conformality, and insulating properties.
Due to its high volatility and stability, TMA can effectively improve the quality and efficiency of thin film deposition processes, ensuring uniform and efficient film deposition.
In semiconductor manufacturing, aluminum oxide thin films deposited through a cycle of trimethylaluminum and water are widely used as high-k gate dielectrics in transistors and as passivation protective layers on chip surfaces. These films effectively block contaminants such as sodium ions, significantly improving device reliability and stability.
TMA is an important organic synthesis reagent used to introduce methyl groups into compounds, or as a strong Lewis acid catalyst to activate specific chemical bonds and promote Diels-Alder reactions.
Using ALD technology, this compound can be used to coat the surface of various complex nanostructured materials with an ultrathin, uniform aluminum oxide shell. This layer can serve as a diffusion barrier, passivation layer, or substrate for subsequent functionalization, and has a wide range of applications in sensors and catalysis.
Trimethylaluminium reacts violently with air and water, so all operations must be performed in a system that is strictly isolated from air and moisture (such as a glove box or sealed conveying system).
The system and cylinders must be thoroughly leak tested and purged with inert gas before use.
It is strictly forbidden to contact with any substances containing active hydrogen or oxidizing substances (such as oxidants, water, alcohols, etc.). Mixing may cause fire or violent explosion.
When handling TMA, appropriate personal protective equipment must be worn, such as face shield, protective clothing and chemical-resistant gloves.
1. What are the applications of trimethylaluminium in semiconductor manufacturing?
It is commonly used in the preparation of III-V semiconductor materials, such as AlGaAs and AlN, and is widely used in the manufacture of microelectronic and optoelectronic devices.
2. How should a solidified TMA cylinder be handled?
Never heat it directly with an open flame or steam. The correct method is to transfer the entire cylinder to a temperature-controlled, well-ventilated, safe area (such as a safety oven). Under an inert atmosphere, slowly heat it to 20-30°C, gently rolling the cylinder occasionally to ensure even heating. This process must be done carefully to prevent localized overheating that could cause a sudden increase in pressure.
For more information or to purchase Trimethylaluminium(TMA), please feel free to contact us via email or WhatsApp.
Molecular Formula: C3H9Al
Appearance: Colorless liquid
Molecular Weight: 72.09
Melting Point: 15 °C
Boiling Point: 126 °C
Density: 0.81 g/mL at 25 °C
Vapour Pressure: 69.3 mmHg ( 60 °C)
Solubility: Soluble in aromatic hydrocarbons, saturated aliphatic hydrocarbons, alicyclic hydrocarbons, and organic solvents such as ether
Storage Conditions: 0-6°C
Wolfa offers trimethylaluminium with purity up to 99%. This rigorously purified compound contains extremely low levels of metallic impurities, ensuring reliability in high-end semiconductor applications.
Its high reactivity enables many difficult chemical transformations under mild conditions, providing a powerful tool for the synthesis of pharmaceuticals and specialty chemicals.
TMA's highly self-limiting reaction with oxygen-containing sources such as water and ozone makes it the "gold standard" precursor for depositing aluminum oxide thin films using ALD technology. It reacts rapidly, producing films with excellent uniformity, conformality, and insulating properties.
Due to its high volatility and stability, TMA can effectively improve the quality and efficiency of thin film deposition processes, ensuring uniform and efficient film deposition.
In semiconductor manufacturing, aluminum oxide thin films deposited through a cycle of trimethylaluminum and water are widely used as high-k gate dielectrics in transistors and as passivation protective layers on chip surfaces. These films effectively block contaminants such as sodium ions, significantly improving device reliability and stability.
TMA is an important organic synthesis reagent used to introduce methyl groups into compounds, or as a strong Lewis acid catalyst to activate specific chemical bonds and promote Diels-Alder reactions.
Using ALD technology, this compound can be used to coat the surface of various complex nanostructured materials with an ultrathin, uniform aluminum oxide shell. This layer can serve as a diffusion barrier, passivation layer, or substrate for subsequent functionalization, and has a wide range of applications in sensors and catalysis.
Trimethylaluminium reacts violently with air and water, so all operations must be performed in a system that is strictly isolated from air and moisture (such as a glove box or sealed conveying system).
The system and cylinders must be thoroughly leak tested and purged with inert gas before use.
It is strictly forbidden to contact with any substances containing active hydrogen or oxidizing substances (such as oxidants, water, alcohols, etc.). Mixing may cause fire or violent explosion.
When handling TMA, appropriate personal protective equipment must be worn, such as face shield, protective clothing and chemical-resistant gloves.
1. What are the applications of trimethylaluminium in semiconductor manufacturing?
It is commonly used in the preparation of III-V semiconductor materials, such as AlGaAs and AlN, and is widely used in the manufacture of microelectronic and optoelectronic devices.
2. How should a solidified TMA cylinder be handled?
Never heat it directly with an open flame or steam. The correct method is to transfer the entire cylinder to a temperature-controlled, well-ventilated, safe area (such as a safety oven). Under an inert atmosphere, slowly heat it to 20-30°C, gently rolling the cylinder occasionally to ensure even heating. This process must be done carefully to prevent localized overheating that could cause a sudden increase in pressure.
For more information or to purchase Trimethylaluminium(TMA), please feel free to contact us via email or WhatsApp.
