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Appearance: Off-white powder
Molecular Weight: 284.19
Melting Point: 296 °C (dec.)(lit.)
Boiling Point: 200°C
Solubility: Reacts with water
Package Information: 5g;25g(Packaging as needed)
Tris(cyclopentadienyl) yttrium has a high vapor pressure, providing a uniform yttrium source supply during the deposition process, maintaining efficient and stable transport, and enhancing the deposition rate and uniformity of thin films.
As an organometallic precursor for yttrium, YCp3 offers exceptional purity, containing over 99.9% yttrium. This ensures the quality of downstream materials and is particularly suitable for the preparation of microelectronic and optoelectronic materials, where purity is crucial.
YCp3 can be used in thin-film deposition processes such as ALD and CVD, helping to produce high-quality yttrium oxide films and yttrium-doped materials. These materials are widely used in high-tech products such as lasers.
This compound can react with a variety of gases or reactants to form yttrium compounds, and is widely used in the preparation of novel optoelectronic materials and functional films.
Tris(cyclopentadienyl) yttrium is widely used as a model compound to study the reaction mechanisms, bonding properties, and catalytic behavior of lanthanide organometallic chemistry.
YCp3, as a yttrium source, plays an important role in the synthesis of nanomaterials, particularly in the preparation of high-efficiency energy storage materials and catalysts.
It is widely used in ALD/CVD processes to produce high-quality yttrium oxide thin films, which are widely used in optical coatings, lasers, and other fields.
As an yttrium source, this compound can be used to prepare various yttrium-doped functional materials, such as yttrium-doped zirconia, which are widely used in battery materials and optoelectronic devices.
Tris (cyclopentadienyl) yttrium must be stored in a sealed container filled with inert gas in a cool and dry environment away from fire and heat sources, and the integrity of the packaging must be checked regularly.
It is strictly forbidden to store or contact it with water, oxidants, strong acids, alcohols and other substances to prevent violent chemical reactions and serious consequences.
When handling YCp3, you must wear safety glasses, protective gloves and protective clothing, and operate in a well-ventilated fume hood to avoid generating dust or inhaling its vapor.
Once leakage occurs, it should be immediately covered with dry inert adsorbent materials (such as sand, diatomaceous earth, etc.) under an inert atmosphere and carefully collected.
1. What are the uses of tris(cyclopentadienyl) yttrium?
This compound is primarily used in the preparation of high-quality yttrium oxide thin films. It is also used in yttrium-doped materials, optoelectronic materials, nanomaterials, and other fields.
2. What is the common co-reactant used when depositing yttrium oxide thin films using YCp3?
Similar to most cyclopentadienyl metal precursors, a common co-reactant is an oxygen-containing source such as water, oxygen, or ozone.
3. What are the main differences between tris(cyclopentadienyl) yttrium (YCp3) and tris(methylcyclopentadienyl) yttrium (Y(MeCp)3)? How should one choose between them?
The main differences lie in volatility and thermal stability. Y(MeCp)3, due to the introduction of a methyl group, has higher volatility and better thermal stability, making it more suitable for MOCVD/ALD processes in industry, where stability and reproducibility are crucial. YCp3, as a base compound, is more commonly used in basic scientific research and process exploration. The choice depends on the specific application scenario and the required precursor performance.
For more information or to purchase Tris(Cyclopentadienyl) Yttrium(YCp3), please feel free to contact us via email or WhatsApp.
Appearance: Off-white powder
Molecular Weight: 284.19
Melting Point: 296 °C (dec.)(lit.)
Boiling Point: 200°C
Solubility: Reacts with water
Package Information: 5g;25g(Packaging as needed)
Tris(cyclopentadienyl) yttrium has a high vapor pressure, providing a uniform yttrium source supply during the deposition process, maintaining efficient and stable transport, and enhancing the deposition rate and uniformity of thin films.
As an organometallic precursor for yttrium, YCp3 offers exceptional purity, containing over 99.9% yttrium. This ensures the quality of downstream materials and is particularly suitable for the preparation of microelectronic and optoelectronic materials, where purity is crucial.
YCp3 can be used in thin-film deposition processes such as ALD and CVD, helping to produce high-quality yttrium oxide films and yttrium-doped materials. These materials are widely used in high-tech products such as lasers.
This compound can react with a variety of gases or reactants to form yttrium compounds, and is widely used in the preparation of novel optoelectronic materials and functional films.
Tris(cyclopentadienyl) yttrium is widely used as a model compound to study the reaction mechanisms, bonding properties, and catalytic behavior of lanthanide organometallic chemistry.
YCp3, as a yttrium source, plays an important role in the synthesis of nanomaterials, particularly in the preparation of high-efficiency energy storage materials and catalysts.
It is widely used in ALD/CVD processes to produce high-quality yttrium oxide thin films, which are widely used in optical coatings, lasers, and other fields.
As an yttrium source, this compound can be used to prepare various yttrium-doped functional materials, such as yttrium-doped zirconia, which are widely used in battery materials and optoelectronic devices.
Tris (cyclopentadienyl) yttrium must be stored in a sealed container filled with inert gas in a cool and dry environment away from fire and heat sources, and the integrity of the packaging must be checked regularly.
It is strictly forbidden to store or contact it with water, oxidants, strong acids, alcohols and other substances to prevent violent chemical reactions and serious consequences.
When handling YCp3, you must wear safety glasses, protective gloves and protective clothing, and operate in a well-ventilated fume hood to avoid generating dust or inhaling its vapor.
Once leakage occurs, it should be immediately covered with dry inert adsorbent materials (such as sand, diatomaceous earth, etc.) under an inert atmosphere and carefully collected.
1. What are the uses of tris(cyclopentadienyl) yttrium?
This compound is primarily used in the preparation of high-quality yttrium oxide thin films. It is also used in yttrium-doped materials, optoelectronic materials, nanomaterials, and other fields.
2. What is the common co-reactant used when depositing yttrium oxide thin films using YCp3?
Similar to most cyclopentadienyl metal precursors, a common co-reactant is an oxygen-containing source such as water, oxygen, or ozone.
3. What are the main differences between tris(cyclopentadienyl) yttrium (YCp3) and tris(methylcyclopentadienyl) yttrium (Y(MeCp)3)? How should one choose between them?
The main differences lie in volatility and thermal stability. Y(MeCp)3, due to the introduction of a methyl group, has higher volatility and better thermal stability, making it more suitable for MOCVD/ALD processes in industry, where stability and reproducibility are crucial. YCp3, as a base compound, is more commonly used in basic scientific research and process exploration. The choice depends on the specific application scenario and the required precursor performance.
For more information or to purchase Tris(Cyclopentadienyl) Yttrium(YCp3), please feel free to contact us via email or WhatsApp.
