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Tris(Cyclopentadienyl) Yttrium

YCp3

CAS: 1294-07-1
 
YCp3 is a volatile yttrium organometallic precursor widely employed in Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) processes. It provides a reliable source of yttrium for depositing yttrium oxide (Y₂O₃) thin films, which are valued as protective coatings, and functional layers in semiconductors, optoelectronics, and materials research.
Availability:

Name: Tris(cyclopentadiene) yttrium ; YCp3

MF: C15H15Y

MW: 284.19

CAS: 1294-07-1

Appearance: Off-white to yellow powder

MP: 296°C

BP: 200 °C

Sensitivity: Air & moisture sensitive


Key Properties

  1. High volatility and sufficient thermal stability for vapor-phase deposition

  2. Produces uniform, stoichiometric Y₂O₃ thin films

  3. Compatible with semiconductor ALD/CVD tools and bubbler systems

  4. Requires inert atmosphere handling (N₂ or Ar)

Main Applications

  • Semiconductors & Microelectronics

Used as an ALD/CVD precursor for yttrium oxide films in logic, memory, and high-k dielectric applications.

  • Dielectric & Gate Oxides

Source for Y₂O₃ gate dielectrics, offering high permittivity and thermal stability.

  • Optical & Functional Coatings

Applied in optoelectronics, protective coatings, and advanced materials research.

Handling & Storage

  1. Store in airtight containers under inert gas (argon or nitrogen recommended)

  2. Avoid contact with air, moisture, and heat to maintain stability

  3. Handle using glovebox or Schlenk line techniques


Custom packaging for R&D or production scale.


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