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Appearance: Colorless to light yellow liquid
Molecular Weight: 295.01
Boiling Point: 53-55 °C (0.1 mmHg)
Density: 1.17
Acidity Coefficient(pKa): 3.60±0.70(Predicted)
Hydrolysis Sensitivity: Reacts rapidly with water and protic solvents
Package Information: 25g;100g
Tetrakis (dimethylamino) tin has a boiling point of only approximately 53-55°C under low pressure conditions, facilitating rapid evaporation, migration, and film formation during vapor phase transport and deposition, thereby improving manufacturing efficiency.
Through advanced synthesis and purification processes, our products achieve extremely high purity (greater than or equal to 99.99%), effectively preventing the negative impact of impurities on device performance.
TDMASn can form uniform, dense, and highly pure thin films, even on complex three-dimensional structures. This is crucial for the fabrication of high-performance microelectronic devices.
Although TDMASn is moisture-sensitive, using it in an inert atmosphere and dry environment actually results in a faster reaction rate and better deposition results.
In semiconductor manufacturing and optoelectronic devices, tetrakis (dimethylamino) tin can be used as a tin source to prepare Sn-compound thin films, such as SnO₂ and tin-based compounds, via chemical vapor deposition techniques.
This compound can be used as a precursor in laboratory or industrial research in organometallic chemistry, metal-nitride preparation, and metal-oxide nanostructure synthesis.
Tin oxide thin films deposited using TDMASn exhibit sensitive electrical responses to certain gases (such as CO), making them widely used in the fabrication of highly sensitive gas sensors. They are also suitable for use as functional protective coatings with specific optical or electrical properties.
Tetrakis (dimethylamino) tin is extremely sensitive to moisture and will rapidly hydrolyze upon contact with it, potentially generating heat and byproducts. Therefore, all operations must be performed in a glove box or closed system filled with high-purity nitrogen or argon.
It is strictly forbidden to mix or contact it with strong oxidizers, acids and other substances, otherwise it may cause a violent reaction and even lead to the risk of fire or explosion.
When handling TDMASn, personal protective equipment must be worn and operations should be performed in a high-efficiency fume hood to avoid inhalation of its vapor or aerosol.
Before using this compound, you should confirm that the purpose is legal, complies with safety regulations, and that the operator has the corresponding chemical safety knowledge.
1. Are there any special precautions for storing this compound?
Store in a tightly closed, dry, inert atmosphere, away from water, moisture, open flames, and high temperatures. The container should be chemically resistant and airtight, and adequate ventilation and protection should be provided during use.
2. What should I do if it accidentally gets released into the air or onto my skin?
If released into the air, evacuate and ventilate the area immediately. If it comes into contact with skin, flush with plenty of running water for at least 15 minutes, remove contaminated clothing, and seek medical attention if necessary. Keep away from sources of ignition.
3. What derivatives or alternatives are available?
Tin compound precursors also include other ligand systems (such as tin-alkyl, tin-halide, and tin-amine ligands). When selecting a ligand, consider parameters such as volatility, thermal stability, and deposition products.
For more information or to purchase Tetrakis (Dimethylamino) Tin(TDMASn), please feel free to contact us via email or WhatsApp.
Appearance: Colorless to light yellow liquid
Molecular Weight: 295.01
Boiling Point: 53-55 °C (0.1 mmHg)
Density: 1.17
Acidity Coefficient(pKa): 3.60±0.70(Predicted)
Hydrolysis Sensitivity: Reacts rapidly with water and protic solvents
Package Information: 25g;100g
Tetrakis (dimethylamino) tin has a boiling point of only approximately 53-55°C under low pressure conditions, facilitating rapid evaporation, migration, and film formation during vapor phase transport and deposition, thereby improving manufacturing efficiency.
Through advanced synthesis and purification processes, our products achieve extremely high purity (greater than or equal to 99.99%), effectively preventing the negative impact of impurities on device performance.
TDMASn can form uniform, dense, and highly pure thin films, even on complex three-dimensional structures. This is crucial for the fabrication of high-performance microelectronic devices.
Although TDMASn is moisture-sensitive, using it in an inert atmosphere and dry environment actually results in a faster reaction rate and better deposition results.
In semiconductor manufacturing and optoelectronic devices, tetrakis (dimethylamino) tin can be used as a tin source to prepare Sn-compound thin films, such as SnO₂ and tin-based compounds, via chemical vapor deposition techniques.
This compound can be used as a precursor in laboratory or industrial research in organometallic chemistry, metal-nitride preparation, and metal-oxide nanostructure synthesis.
Tin oxide thin films deposited using TDMASn exhibit sensitive electrical responses to certain gases (such as CO), making them widely used in the fabrication of highly sensitive gas sensors. They are also suitable for use as functional protective coatings with specific optical or electrical properties.
Tetrakis (dimethylamino) tin is extremely sensitive to moisture and will rapidly hydrolyze upon contact with it, potentially generating heat and byproducts. Therefore, all operations must be performed in a glove box or closed system filled with high-purity nitrogen or argon.
It is strictly forbidden to mix or contact it with strong oxidizers, acids and other substances, otherwise it may cause a violent reaction and even lead to the risk of fire or explosion.
When handling TDMASn, personal protective equipment must be worn and operations should be performed in a high-efficiency fume hood to avoid inhalation of its vapor or aerosol.
Before using this compound, you should confirm that the purpose is legal, complies with safety regulations, and that the operator has the corresponding chemical safety knowledge.
1. Are there any special precautions for storing this compound?
Store in a tightly closed, dry, inert atmosphere, away from water, moisture, open flames, and high temperatures. The container should be chemically resistant and airtight, and adequate ventilation and protection should be provided during use.
2. What should I do if it accidentally gets released into the air or onto my skin?
If released into the air, evacuate and ventilate the area immediately. If it comes into contact with skin, flush with plenty of running water for at least 15 minutes, remove contaminated clothing, and seek medical attention if necessary. Keep away from sources of ignition.
3. What derivatives or alternatives are available?
Tin compound precursors also include other ligand systems (such as tin-alkyl, tin-halide, and tin-amine ligands). When selecting a ligand, consider parameters such as volatility, thermal stability, and deposition products.
For more information or to purchase Tetrakis (Dimethylamino) Tin(TDMASn), please feel free to contact us via email or WhatsApp.
