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Molecular Formula: C3H9Ga
Appearance: Colorless liquid
Molecular Weight: 114.83
Melting Point: -15,8°C
Boiling Point: 55,7°C
Density: 1,151 g/cm3
Hydrolysis Sensitivity: Reacts very quickly with moisture and oxygen
Package Information: 100g,500g, 1kg or customized
Wolfa's trimethylgallium undergoes multiple distillation and purification steps, typically achieving purity levels of 99% or higher. This high-purity gallium source has high application value in fields such as semiconductors and optoelectronics, ensuring the high quality of downstream materials.
Due to its high volatility, trimethylgallium can make thin film deposition processes more efficient, control the quality of the deposited material, and increase deposition rates, making it particularly important in the field of microelectronics.
TMG's moderate vapor pressure enables stable and controllable delivery into the MOCVD reactor, improving thin film deposition rate and uniformity.
During the MOCVD deposition process, this compound achieves high decomposition and growth rates at relatively low substrate temperatures, helping to reduce crystal defects and improve film quality.
Trimethylgallium can be used to grow gallium-based thin films, suitable for the manufacture of high-precision materials such as solar cells and sensors.
TMG is also used in the manufacture of various optoelectronic devices, such as laser diodes and high-speed photodetectors. These devices are key components in fiber-optic communications and sensing systems and equipment.
In concentrated photovoltaics and certain space solar cells, III-V multi-junction solar cells fabricated with TMG (such as GaInP/GaAs/Ge) achieve the world's highest photoelectric conversion efficiency and are a key pillar of cutting-edge photovoltaic technology.
The storage environment of trimethylgallium must be oxygen-free and water-free, and operations must be performed in a system or glove box filled with high-purity inert gas.
TMG must be stored in special steel cylinders that have undergone a special surface passivation treatment (such as SST) and are equipped with dedicated pressure relief valves and piping. The storage area should be cool, well-ventilated, and away from fire and heat sources.
If a small amount of leakage occurs, it should be immediately absorbed with an anhydrous adsorbent (such as anhydrous calcium chloride) or covered with dry inert materials (such as dry sand). After the reaction is complete, it should be treated as hazardous chemical waste. All wastes must be handled by qualified professional institutions.
Skin contact can cause severe chemical burns. Immediately rinse with plenty of water, remove contaminated clothing, and seek medical attention.
1. How does trimethylgallium differ from other gallium source precursors?
Its high volatility makes it suitable for high-precision vapor deposition processes such as MOCVD and ALD, resulting in higher-quality and more uniform gallium-based films.
2. What are the applications of this compound in semiconductor manufacturing?
It is primarily used in the manufacture of III-V semiconductor materials such as GaAs and GaN, and is a key precursor for the production of high-performance microelectronic and optoelectronic devices.
3. How specifically does TMG purity affect the final device performance?
The purity of TMG directly determines the electrical and optical properties of the epitaxial film. For example, carbon impurities (from incompletely decomposed methyl groups) act as acceptors, compensating for the electron concentration in n-type GaN. High-purity TMG is a prerequisite for achieving high-brightness, long-life LEDs and high-efficiency, low-noise RF devices.
For more information or to purchase Trimethylgallium(TMG), please feel free to contact us via email or WhatsApp.
Molecular Formula: C3H9Ga
Appearance: Colorless liquid
Molecular Weight: 114.83
Melting Point: -15,8°C
Boiling Point: 55,7°C
Density: 1,151 g/cm3
Hydrolysis Sensitivity: Reacts very quickly with moisture and oxygen
Package Information: 100g,500g, 1kg or customized
Wolfa's trimethylgallium undergoes multiple distillation and purification steps, typically achieving purity levels of 99% or higher. This high-purity gallium source has high application value in fields such as semiconductors and optoelectronics, ensuring the high quality of downstream materials.
Due to its high volatility, trimethylgallium can make thin film deposition processes more efficient, control the quality of the deposited material, and increase deposition rates, making it particularly important in the field of microelectronics.
TMG's moderate vapor pressure enables stable and controllable delivery into the MOCVD reactor, improving thin film deposition rate and uniformity.
During the MOCVD deposition process, this compound achieves high decomposition and growth rates at relatively low substrate temperatures, helping to reduce crystal defects and improve film quality.
Trimethylgallium can be used to grow gallium-based thin films, suitable for the manufacture of high-precision materials such as solar cells and sensors.
TMG is also used in the manufacture of various optoelectronic devices, such as laser diodes and high-speed photodetectors. These devices are key components in fiber-optic communications and sensing systems and equipment.
In concentrated photovoltaics and certain space solar cells, III-V multi-junction solar cells fabricated with TMG (such as GaInP/GaAs/Ge) achieve the world's highest photoelectric conversion efficiency and are a key pillar of cutting-edge photovoltaic technology.
The storage environment of trimethylgallium must be oxygen-free and water-free, and operations must be performed in a system or glove box filled with high-purity inert gas.
TMG must be stored in special steel cylinders that have undergone a special surface passivation treatment (such as SST) and are equipped with dedicated pressure relief valves and piping. The storage area should be cool, well-ventilated, and away from fire and heat sources.
If a small amount of leakage occurs, it should be immediately absorbed with an anhydrous adsorbent (such as anhydrous calcium chloride) or covered with dry inert materials (such as dry sand). After the reaction is complete, it should be treated as hazardous chemical waste. All wastes must be handled by qualified professional institutions.
Skin contact can cause severe chemical burns. Immediately rinse with plenty of water, remove contaminated clothing, and seek medical attention.
1. How does trimethylgallium differ from other gallium source precursors?
Its high volatility makes it suitable for high-precision vapor deposition processes such as MOCVD and ALD, resulting in higher-quality and more uniform gallium-based films.
2. What are the applications of this compound in semiconductor manufacturing?
It is primarily used in the manufacture of III-V semiconductor materials such as GaAs and GaN, and is a key precursor for the production of high-performance microelectronic and optoelectronic devices.
3. How specifically does TMG purity affect the final device performance?
The purity of TMG directly determines the electrical and optical properties of the epitaxial film. For example, carbon impurities (from incompletely decomposed methyl groups) act as acceptors, compensating for the electron concentration in n-type GaN. High-purity TMG is a prerequisite for achieving high-brightness, long-life LEDs and high-efficiency, low-noise RF devices.
For more information or to purchase Trimethylgallium(TMG), please feel free to contact us via email or WhatsApp.
