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Name: Tetrakis (dimethylamino) zirconium (IV); TDMAZ
MF: Zr[N(CH3)2]4
MW: 267.53
CAS: 19756-04-8
Appearance: white powder
Storage conditions: 2-8°C
Tetrakis(dimethylamino)zirconium, also known as TDMAZ, is a high-purity organometallic zirconium precursor widely used in Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) processes. With excellent thermal stability, high volatility, and low impurity levels, TDMAZ enables the deposition of uniform, conformal ZrO₂ and zirconium-containing thin films on complex 3D structures, making it ideal for semiconductor manufacturing, high-k dielectric layers, passivation coatings, and optical applications.
Our TDMAZ is produced under strict quality control in a clean-environment facility, ensuring trace-metal impurities at ppb levels and consistent performance for leading-edge electronics manufacturing.
Available in customized packaging, including stainless steel bubblers for direct tool integration.
High-k dielectric ZrO₂ films in DRAM, logic, and advanced nodes.
Barrier and interface layers in semiconductor devices.
Optical coatings and protective films.
Research in material science and nanotechnology.
If you have any inquiries, feel free to reach out to us via the email or WhatsApp.
Name: Tetrakis (dimethylamino) zirconium (IV); TDMAZ
MF: Zr[N(CH3)2]4
MW: 267.53
CAS: 19756-04-8
Appearance: white powder
Storage conditions: 2-8°C
Tetrakis(dimethylamino)zirconium, also known as TDMAZ, is a high-purity organometallic zirconium precursor widely used in Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD) processes. With excellent thermal stability, high volatility, and low impurity levels, TDMAZ enables the deposition of uniform, conformal ZrO₂ and zirconium-containing thin films on complex 3D structures, making it ideal for semiconductor manufacturing, high-k dielectric layers, passivation coatings, and optical applications.
Our TDMAZ is produced under strict quality control in a clean-environment facility, ensuring trace-metal impurities at ppb levels and consistent performance for leading-edge electronics manufacturing.
Available in customized packaging, including stainless steel bubblers for direct tool integration.
High-k dielectric ZrO₂ films in DRAM, logic, and advanced nodes.
Barrier and interface layers in semiconductor devices.
Optical coatings and protective films.
Research in material science and nanotechnology.
If you have any inquiries, feel free to reach out to us via the email or WhatsApp.
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