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Name: Tris(Methylcyclopentadienyl) Yttrium ; Y(MeCp)3
MF: C18H9Y
MW: 314.18
CAS: 329735-72-0
Appearance: yellowl crystal
High volatility and thermal stability suitable for vapor-phase deposition
Produces stoichiometric and uniform Y₂O₃ films
Compatible with semiconductor-grade gas delivery systems
Inert atmosphere handling required to maintain purity
Semiconductors & Microelectronics
ALD/CVD precursor for yttrium oxide dielectric layers, used in logic, DRAM, and advanced transistor structures.
Dielectric & Gate Oxides
Key material for high-k dielectric thin films in next-generation devices.
Optoelectronics & Functional Coatings
Applied in optical coatings, protective layers, and materials research.
Store in airtight containers under inert gas (N₂ or Ar)
Protect from air, moisture, and heat to avoid decomposition
Handle in glovebox or using Schlenk line techniques
Custom packaging for R&D or production scale.
If you have any inquiries, feel free to reach out to us via the email or WhatsApp.
Name: Tris(Methylcyclopentadienyl) Yttrium ; Y(MeCp)3
MF: C18H9Y
MW: 314.18
CAS: 329735-72-0
Appearance: yellowl crystal
High volatility and thermal stability suitable for vapor-phase deposition
Produces stoichiometric and uniform Y₂O₃ films
Compatible with semiconductor-grade gas delivery systems
Inert atmosphere handling required to maintain purity
Semiconductors & Microelectronics
ALD/CVD precursor for yttrium oxide dielectric layers, used in logic, DRAM, and advanced transistor structures.
Dielectric & Gate Oxides
Key material for high-k dielectric thin films in next-generation devices.
Optoelectronics & Functional Coatings
Applied in optical coatings, protective layers, and materials research.
Store in airtight containers under inert gas (N₂ or Ar)
Protect from air, moisture, and heat to avoid decomposition
Handle in glovebox or using Schlenk line techniques
Custom packaging for R&D or production scale.
If you have any inquiries, feel free to reach out to us via the email or WhatsApp.
