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Name: Hafnium(IV) Chloride
MF: HfCl4
MW: 320.3
CAS: 13499-05-3
MP: 432°C
BP: 315.47°C
Solubility: Soluble in methanol and acetone, soluble in water
Appearance: White to yellowish powder
Storage conditions: Inert gas environment, room temperature
Semiconductor Manufacturing
Used as an ALD/CVD precursor for depositing high-κ hafnium oxide (HfO₂) gate dielectrics in logic and memory devices.
Aerospace & Superalloys
Serves as a starting material for hafnium metal and alloys with high corrosion resistance and thermal stability.
Catalysis
Functions as a Lewis acid catalyst in fine chemical and pharmaceutical synthesis.
Optical & Coating Materials
Precursor for hafnium-based optical coatings and specialized ceramics.
Nuclear Technology
Applied in control rod materials due to hafnium’s neutron absorption properties.
Custom packaging for R&D or production scale.
If you have any inquiries, feel free to reach out to us via the email or WhatsApp.
Name: Hafnium(IV) Chloride
MF: HfCl4
MW: 320.3
CAS: 13499-05-3
MP: 432°C
BP: 315.47°C
Solubility: Soluble in methanol and acetone, soluble in water
Appearance: White to yellowish powder
Storage conditions: Inert gas environment, room temperature
Semiconductor Manufacturing
Used as an ALD/CVD precursor for depositing high-κ hafnium oxide (HfO₂) gate dielectrics in logic and memory devices.
Aerospace & Superalloys
Serves as a starting material for hafnium metal and alloys with high corrosion resistance and thermal stability.
Catalysis
Functions as a Lewis acid catalyst in fine chemical and pharmaceutical synthesis.
Optical & Coating Materials
Precursor for hafnium-based optical coatings and specialized ceramics.
Nuclear Technology
Applied in control rod materials due to hafnium’s neutron absorption properties.
Custom packaging for R&D or production scale.
If you have any inquiries, feel free to reach out to us via the email or WhatsApp.
