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Appearance: Orange crystal
Molecular Weight: 401.33
Melting Point: 100 °C (dec.)(lit.)
Boiling Point: 100°C 0,1mm
Hydrolysis Sensitivity: Reacts rapidly with water and protic solvents
Pentakis (dimethylamino) tantalum maintains its structural stability over a wide temperature range and resists decomposition, making it an ideal choice for ALD and CVD processes.
PDMAT utilizes a high-purity synthesis process, achieving purity levels as high as 99.999%, meeting semiconductor industry standards and ensuring device performance.
Compared to other tantalum compounds, PDMAT produces fewer byproducts during reactions, supporting the concept of green chemistry.
This compound has a wide range of applications, from electronics and semiconductors to catalysis.
Pentakis (dimethylamino) tantalum is used as a key precursor in this field for depositing tantalum-based thin films. It can also be used in CVD and ALD processes to achieve nanoscale coatings, improving device performance and reliability.
PDMAT is commonly used in academic and industrial research to develop novel organometallic tantalum composites and high-performance coatings.
In this field, PDMAT is used as a highly efficient catalyst or precursor to promote coupling reactions and polymerization processes, such as in the pharmaceutical and polymer industries.
PDMAT must be stored in a dry, cool environment, preferably sealed under the protection of inert gas, avoiding contact with moisture or air to prevent hydrolysis or oxidation that may cause performance degradation.
It is sensitive to humidity and a dry box or vacuum packaging is recommended.
This compound should not come into contact with strong oxidants or water to avoid violent reactions that could produce harmful gases or heat. It should be stored separately from other chemicals in the operating area.
In the event of a leak, immediately cover with inert absorbent material and dispose of the residue in a ventilated environment.
Residues or waste must be treated as hazardous chemicals and must not be discharged directly into water or soil.
1. What are the advantages of PDMAT in semiconductor processing?
Its primary advantages lie in its excellent reactivity and high thermal stability, making it suitable for both ALD and CVD processes and capable of depositing uniform thin films.
2. How can I ensure the stability of pentakis (dimethylamino) tantalum?
To ensure stability, this compound must be handled and stored in an inert atmosphere and protected from moisture to extend its shelf life.
3. Which ALD systems is pentakis (dimethylamino) tantalum compatible with?
It is compatible with most mainstream ALD systems (such as Beneq, Picosun, and Oxford Instruments), and demonstrates excellent temperature control stability and reaction efficiency in TaN/Ta₂O₅ thin film deposition.
For more information or to purchase Pentakis (Dimethylamino) Tantalum(PDMAT), please feel free to contact us via email or WhatsApp.
Appearance: Orange crystal
Molecular Weight: 401.33
Melting Point: 100 °C (dec.)(lit.)
Boiling Point: 100°C 0,1mm
Hydrolysis Sensitivity: Reacts rapidly with water and protic solvents
Pentakis (dimethylamino) tantalum maintains its structural stability over a wide temperature range and resists decomposition, making it an ideal choice for ALD and CVD processes.
PDMAT utilizes a high-purity synthesis process, achieving purity levels as high as 99.999%, meeting semiconductor industry standards and ensuring device performance.
Compared to other tantalum compounds, PDMAT produces fewer byproducts during reactions, supporting the concept of green chemistry.
This compound has a wide range of applications, from electronics and semiconductors to catalysis.
Pentakis (dimethylamino) tantalum is used as a key precursor in this field for depositing tantalum-based thin films. It can also be used in CVD and ALD processes to achieve nanoscale coatings, improving device performance and reliability.
PDMAT is commonly used in academic and industrial research to develop novel organometallic tantalum composites and high-performance coatings.
In this field, PDMAT is used as a highly efficient catalyst or precursor to promote coupling reactions and polymerization processes, such as in the pharmaceutical and polymer industries.
PDMAT must be stored in a dry, cool environment, preferably sealed under the protection of inert gas, avoiding contact with moisture or air to prevent hydrolysis or oxidation that may cause performance degradation.
It is sensitive to humidity and a dry box or vacuum packaging is recommended.
This compound should not come into contact with strong oxidants or water to avoid violent reactions that could produce harmful gases or heat. It should be stored separately from other chemicals in the operating area.
In the event of a leak, immediately cover with inert absorbent material and dispose of the residue in a ventilated environment.
Residues or waste must be treated as hazardous chemicals and must not be discharged directly into water or soil.
1. What are the advantages of PDMAT in semiconductor processing?
Its primary advantages lie in its excellent reactivity and high thermal stability, making it suitable for both ALD and CVD processes and capable of depositing uniform thin films.
2. How can I ensure the stability of pentakis (dimethylamino) tantalum?
To ensure stability, this compound must be handled and stored in an inert atmosphere and protected from moisture to extend its shelf life.
3. Which ALD systems is pentakis (dimethylamino) tantalum compatible with?
It is compatible with most mainstream ALD systems (such as Beneq, Picosun, and Oxford Instruments), and demonstrates excellent temperature control stability and reaction efficiency in TaN/Ta₂O₅ thin film deposition.
For more information or to purchase Pentakis (Dimethylamino) Tantalum(PDMAT), please feel free to contact us via email or WhatsApp.
