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Name: Tungsten(VI) hexachloride
MF: WCl6
MW: 396.558
CAS: 13283-01-7
Appearance: Dark violet crystalline
Thin-Film Deposition (CVD/ALD):
Precursor for tungsten thin films in semiconductor fabrication (gate electrodes, interconnects).
Catalysis:
Acts as a Lewis acid catalyst in acetalization, alkylation, and metathesis reactions.
Synthesis of Tungsten Complexes:
Building block for preparing low-valent tungsten compounds and organometallic catalysts.
Advanced Materials:
Used in the production of conductive coatings and tungsten alloys.
Custom packaging for R&D or production scale.
If you have any inquiries, feel free to reach out to us via the email or WhatsApp.
Name: Tungsten(VI) hexachloride
MF: WCl6
MW: 396.558
CAS: 13283-01-7
Appearance: Dark violet crystalline
Thin-Film Deposition (CVD/ALD):
Precursor for tungsten thin films in semiconductor fabrication (gate electrodes, interconnects).
Catalysis:
Acts as a Lewis acid catalyst in acetalization, alkylation, and metathesis reactions.
Synthesis of Tungsten Complexes:
Building block for preparing low-valent tungsten compounds and organometallic catalysts.
Advanced Materials:
Used in the production of conductive coatings and tungsten alloys.
Custom packaging for R&D or production scale.
If you have any inquiries, feel free to reach out to us via the email or WhatsApp.
