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| Synonyms | Tetrakis(diethylaMino)zirconiuM(IV), 99%; Tetrakis(diethylamino)zirconium,99%;Tetrakis(diethylamino)zirkonium;TETRAKIS(DIETHYLAMINO)ZIRCONIUM |
| Molecular Formula | C16H40N4Zr |
| Appearance | Yellow liquid |
| Molecular Weight | 379.74 |
| Boiling Point | 128 °C0.05 mm Hg(lit.) |
| Density | 1.026 g/mL at 25 °C(lit.) |
| Refractive Index | n20/D 1.51(lit.) |
| Flash Point | 54 °F |
| Storage Conditions | Water-free area |
| Purity | 6N |
| Package Information | 100g, 500g, 1kg, or customized |
Tetrakis (Diethylamino) Zirconium exhibits high surface reactivity, making it suitable for low-temperature ALD processes and contributing to the acquisition of dense, uniform zirconia films.
As a liquid precursor, TDEAZ exhibits stable vapor transport properties under controlled heating conditions, making it suitable for precise metering and process scale-up.
When used within a suitable process window, it can effectively reduce the risk of carbon residue and meet the purity requirements of semiconductor devices for thin films.
TDEAZ has been validated in various zirconium oxide (ZrO₂) and related composite thin film processes, and is suitable for R&D, pilot production and mass production stages.
Tetrakis (Diethylamino) Zirconium is a commonly used zirconium source for preparing ZrO₂ thin films, and is widely used in the deposition of high dielectric constant materials in logic devices, memory, and advanced processes.
Under specific CVD process conditions, TDEAZ can be used to deposit zirconium-based thin films for the construction of functional or interface layers.
In universities and research institutions, this precursor is often used in research on novel thin film materials, interface engineering, and process parameter optimization.
Beyond the semiconductor field, TDEAZ is also being used to explore the preparation pathways for high-performance ceramic coatings and functional oxide thin films.
Tetrakis (Diethylamino) Zirconium is highly sensitive to moisture and air, and therefore must be handled and stored in an inert atmosphere (such as nitrogen or argon) to prevent any form of moisture from entering.
This compound must not come into contact with water, alcohols, strong oxidizing agents, or acidic substances to prevent violent reactions or decomposition.
Protective gloves, goggles, and other protective equipment must be worn during operation, and the operation must be carried out in a fume hood or inert atmosphere system.
If the chemical comes into contact with skin or eyes, rinse immediately with plenty of water and seek medical attention promptly. Also, inform a professional about the nature of the chemical.
During transportation, it is necessary to ensure that the seal is intact and to avoid high temperature, vibration and damage to the packaging. It is usually carried out in accordance with the regulations for hazardous chemicals.
1. What is Tetrakis (Diethylamino) Zirconium?
TDEAZ is an organozirconium precursor with the chemical formula C16H40N4Zr. It has a boiling point of 128 °C (0.05 mm Hg, lit.) and a flash point of 54 °F. It is primarily used in ALD and CVD processes to prepare zirconium-based thin films.
2. What materials is TDEAZ primarily used for depositing?
The most common application is the deposition of zirconium oxide (ZrO₂) thin films, and it can also be used to study zirconium-based composite oxide thin films.
3. Is this compound suitable for low-temperature ALD processes?
Yes, its high reactivity makes it suitable for the relatively low-temperature ALD process window.
4. What are the storage requirements for this product?
It must be stored in anhydrous and oxygen-free conditions, typically using inert gas protection and a dedicated sealed container.
5. Is Tetrakis (Diethylamino) Zirconium suitable for industrial mass production?
With a mature process control and safety system in place, TDEAZ has been widely used in pilot-scale and industrial-scale ALD/CVD production.
Wolfa professionally supplies Tetrakis(Diethylamino) Zirconium, supporting small-batch sampling and large-volume procurement needs. Packaging options include ordinary glass bottles, glass ampoules, metal ampoules, etc.
For product analysis reports (such as COA) or procurement consulting, please feel free to contact us at jomin@wolfabio.com at any time.
| Synonyms | Tetrakis(diethylaMino)zirconiuM(IV), 99%; Tetrakis(diethylamino)zirconium,99%;Tetrakis(diethylamino)zirkonium;TETRAKIS(DIETHYLAMINO)ZIRCONIUM |
| Molecular Formula | C16H40N4Zr |
| Appearance | Yellow liquid |
| Molecular Weight | 379.74 |
| Boiling Point | 128 °C0.05 mm Hg(lit.) |
| Density | 1.026 g/mL at 25 °C(lit.) |
| Refractive Index | n20/D 1.51(lit.) |
| Flash Point | 54 °F |
| Storage Conditions | Water-free area |
| Purity | 6N |
| Package Information | 100g, 500g, 1kg, or customized |
Tetrakis (Diethylamino) Zirconium exhibits high surface reactivity, making it suitable for low-temperature ALD processes and contributing to the acquisition of dense, uniform zirconia films.
As a liquid precursor, TDEAZ exhibits stable vapor transport properties under controlled heating conditions, making it suitable for precise metering and process scale-up.
When used within a suitable process window, it can effectively reduce the risk of carbon residue and meet the purity requirements of semiconductor devices for thin films.
TDEAZ has been validated in various zirconium oxide (ZrO₂) and related composite thin film processes, and is suitable for R&D, pilot production and mass production stages.
Tetrakis (Diethylamino) Zirconium is a commonly used zirconium source for preparing ZrO₂ thin films, and is widely used in the deposition of high dielectric constant materials in logic devices, memory, and advanced processes.
Under specific CVD process conditions, TDEAZ can be used to deposit zirconium-based thin films for the construction of functional or interface layers.
In universities and research institutions, this precursor is often used in research on novel thin film materials, interface engineering, and process parameter optimization.
Beyond the semiconductor field, TDEAZ is also being used to explore the preparation pathways for high-performance ceramic coatings and functional oxide thin films.
Tetrakis (Diethylamino) Zirconium is highly sensitive to moisture and air, and therefore must be handled and stored in an inert atmosphere (such as nitrogen or argon) to prevent any form of moisture from entering.
This compound must not come into contact with water, alcohols, strong oxidizing agents, or acidic substances to prevent violent reactions or decomposition.
Protective gloves, goggles, and other protective equipment must be worn during operation, and the operation must be carried out in a fume hood or inert atmosphere system.
If the chemical comes into contact with skin or eyes, rinse immediately with plenty of water and seek medical attention promptly. Also, inform a professional about the nature of the chemical.
During transportation, it is necessary to ensure that the seal is intact and to avoid high temperature, vibration and damage to the packaging. It is usually carried out in accordance with the regulations for hazardous chemicals.
1. What is Tetrakis (Diethylamino) Zirconium?
TDEAZ is an organozirconium precursor with the chemical formula C16H40N4Zr. It has a boiling point of 128 °C (0.05 mm Hg, lit.) and a flash point of 54 °F. It is primarily used in ALD and CVD processes to prepare zirconium-based thin films.
2. What materials is TDEAZ primarily used for depositing?
The most common application is the deposition of zirconium oxide (ZrO₂) thin films, and it can also be used to study zirconium-based composite oxide thin films.
3. Is this compound suitable for low-temperature ALD processes?
Yes, its high reactivity makes it suitable for the relatively low-temperature ALD process window.
4. What are the storage requirements for this product?
It must be stored in anhydrous and oxygen-free conditions, typically using inert gas protection and a dedicated sealed container.
5. Is Tetrakis (Diethylamino) Zirconium suitable for industrial mass production?
With a mature process control and safety system in place, TDEAZ has been widely used in pilot-scale and industrial-scale ALD/CVD production.
Wolfa professionally supplies Tetrakis(Diethylamino) Zirconium, supporting small-batch sampling and large-volume procurement needs. Packaging options include ordinary glass bottles, glass ampoules, metal ampoules, etc.
For product analysis reports (such as COA) or procurement consulting, please feel free to contact us at jomin@wolfabio.com at any time.
