HOT PRODUCT
We provide a diverse product portfolio and excellent services
  • Pharmaceutical Intermediates
    • High-efficiency Catalysts
      • Hafnium Chloride
        HfCl4

        CAS: 13499-05-3
         
        Hafnium chloride (HfCl₄) is a white to yellowish hygroscopic crystalline solid, widely recognized as a key precursor in high-purity hafnium compound synthesis and advanced thin-film deposition. Its strong Lewis acidity and volatility make it an essential material for semiconductor, aerospace, and catalyst industries.
         
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      • Osmium Carbonyl
        Os3(CO)12

        CAS: 15696-40-9
         
        Osmium carbonyl (Os₃(CO)₁₂) is a crystalline organometallic cluster composed of three osmium atoms bridged by carbonyl ligands. It serves as a specialty catalyst precursor and research-grade reagent in advanced organometallic chemistry, homogeneous catalysis, and nanomaterial development.
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      • Manganese Carbonyl
        Mn2(CO)10

        CAS: 10170-69-1
         
        Manganese carbonyl, commonly in the form dimanganese decacarbonyl (Mn₂(CO)₁₀), is an sticky yellow crystalline organometallic compound consisting of two manganese atoms bridged by carbonyl ligands. It is air-sensitive and serves as a versatile source of Mn(0) in organometallic chemistry. With its strong metal–carbonyl bonds and unique reactivity, it is widely used as a homogeneous catalyst, precursor for manganese complexes, and reactive intermediate in organic synthesis and materials science.
         
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      • Manganese Pentacarbonyl Bromide
        Mn(CO)5Br

        CAS: 14516-54-2
         
        Manganese pentacarbonyl bromide (Mn(CO)₅Br) is an orange, air- and light-sensitive organometallic compound containing a manganese(I) center coordinated to five carbonyl ligands and one bromide ion. It is a key intermediate in organomanganese chemistry and a versatile precursor for Mn-based catalysts, widely used in homogeneous catalysis, fine chemical synthesis, and materials science.
         
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      • Tetrakis(Triphenylphosphine)Nickel
        C72H60NiP4

        CAS: 15133-82-1
         
        Tetrakis(triphenylphosphine)nickel(0), chemical formula Ni(PPh₃)₄, is a bright yellow, air-sensitive coordination complex containing nickel in the zero oxidation state. As a versatile homogeneous catalyst, it plays a critical role in cross-coupling reactions, polymerization catalysis, and organonickel chemistry research. Its four triphenylphosphine ligands stabilize nickel(0), enabling high activity in C–C bond formation and other selective transformations.
         
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      • Scandium Chloride Tetrahydrofuran Complex
        ScCl3·3THF

        CAS: 14782-78-6
         
        Scandium chloride tetrahydrofuran complex, commonly formulated as ScCl₃(THF)₃. This compound serves as a powerful Lewis acid widely utilized in organic synthesis, polymerization catalysis, and rare earth material R&D. Compared with anhydrous ScCl₃, the THF adduct offers enhanced solubility and easier handling in laboratory and scale-up reactions.
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      • Tetrachlorobis(Tetrahydrofuran) Titanium
        TiCl4·2THF

        CAS: 31011-57-1
         
        Tetrachlorobis(tetrahydrofuran)titanium (TiCl₄(THF)₂) is a bright yellow coordination compound consisting of titanium tetrachloride complexed with two tetrahydrofuran molecules. It is a key Lewis acidic titanium complex used in organic synthesis, polymerization catalysis, and advanced materials research. The stabilized THF coordination makes it more manageable than volatile TiCl₄, while retaining excellent reactivity. This compound is especially valued for its role in Ziegler–Natta catalyst systems, stereoselective synthesis, and nanomaterial precursor applications.
         
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      • Ruthenium(III) chloride hydrate
        RuCl3·xH2O

        CAS:14898-67-0
         
        Ruthenium(III) chloride hydrate (RuCl₃·xH₂O) is gray to black crystalline solid and a key ruthenium source used in a variety of industrial and research applications. It is a versatile precursor for synthesizing a wide range of ruthenium complexes, heterogeneous and homogeneous catalysts, as well as functional materials for electronics, electroplating, and energy-related devices. The hydrate form is particularly suitable for aqueous or low-temperature synthetic processes.
         
        Ruthenium(III) chloride hydrate (RuCl₃·xH₂O) is gray to black crystalline powder and a key ruthenium source used in a variety of industrial and research applications. It is a versatile precursor for synthesizing a wide range of ruthenium complexes, heterogeneous and homogeneous catalysts, as well as functional materials for electronics, electroplating, and energy-related devices. The hydrate form is particularly suitable for aqueous or low-temperature synthetic processes.
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      • Flavours and Fragrances
        • ALD/CVD Precursors
          • Tetrakis(Ethylmethylamino) Hafnium
            TEMAH

            CAS: 352535-01-4
             
            Tetrakis(ethylmethylamino)hafnium (Hf(NEtMe)₄, TEMAH) is a high-purity metal-organic ALD precursor designed for the deposition of hafnium-based thin films. With its excellent volatility, thermal stability, and clean decomposition behavior, it is widely used in high-k dielectric integration and next-generation semiconductor device fabrication.
             
             
             
             
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          • Tetrakis(Dimethylamino) Hafnium
            TDMAH

            CAS: 19782-68-4
             
            Tetrakis(dimethylamino)hafnium (Hf[N(CH₃)₂]₄, TDMAH) is a high-purity organometallic precursor with excellent volatility and thermal stability, specifically engineered for Atomic Layer Deposition (ALD) of hafnium-based thin films in advanced semiconductor manufacturing. Its metal–nitrogen bonds ensure clean decomposition, making it a preferred choice for high-κ dielectric integration.
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          • Hafnium Chloride
            HfCl4

            CAS: 13499-05-3
             
            Hafnium chloride (HfCl₄) is a white to yellowish hygroscopic crystalline solid, widely recognized as a key precursor in high-purity hafnium compound synthesis and advanced thin-film deposition. Its strong Lewis acidity and volatility make it an essential material for semiconductor, aerospace, and catalyst industries.
             
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          • Triruthenium Dodecacarbonyl
            Ru3(CO)12

            CAS: 15243-33-1
             
            Triruthenium dodecacarbonyl (Ru₃(CO)₁₂) is a highly specialized organometallic compound composed of three ruthenium atoms coordinated with twelve carbonyl ligands. This compound is used in a variety of industrial applications, including catalysis for organic transformations, materials science, and the synthesis of advanced chemical intermediates. It is particularly valuable as a catalyst precursor in hydrogenation, hydrosilylation, and other metal-catalyzed reactions. Its high reactivity and versatility make it an essential component in the development of novel catalysts and the synthesis of ruthenium-based materials.
             
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          • Cobalt Carbonyl
            Co2(CO)8

            CAS:10210-68-1
             
            Cobalt carbonyl (Co₂(CO)₈) is a highly reactive organometallic compound used in various catalytic and industrial applications. As a versatile metal carbonyl complex, it is particularly important in the synthesis of fine chemicals, the preparation of cobalt-based catalysts, and in the petroleum industry for hydroprocessing reactions. Cobalt carbonyl also plays a significant role in the production of cobalt alloys, where it is utilized for its metal bonding properties. In addition, it is applied in the development of high-performance coatings and in nanomaterial fabrication, owing to its unique chemical reactivity and volatility.
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          • Chromium Hexacarbonyl
            Cr(CO)6

            CAS: 13007-92-6
             
            Chromium hexacarbonyl (Cr(CO)₆) is a versatile organometallic compound used extensively in the synthesis of pharmaceutical intermediates, fragrance compounds. High-purity chromium hexacarbonyl is also used in the repair of integrated circuit photomasks.
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          • Molybdenum Dichloride Dioxide
            MoO2Cl2
             
            CAS: 13637-68-8
             
            Molybdenum dichloride dioxide (MoO₂Cl₂) is a versatile organometallic compound used primarily as a precursor for molybdenum-based catalysts and in the synthesis of molybdenum oxide and other molybdenum compounds. It plays a key role in chemical processes such as selective oxidation, metathesis reactions, and polymerization catalysis. It can be used as a precursor of molybdenum disulfide(MoS2). Due to its unique chemical structure, it is often utilized in fine chemical synthesis, specifically in the production of high-purity molybdenum oxide and other advanced materials.
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          • Molybdenum Hexacarbonyl
            Mo(CO)6

            CAS: 13939-06-5
             
            Molybdenum hexacarbonyl (Mo(CO)₆) is an organometallic compound known for its volatility and utility as a precursor for the deposition of molybdenum thin films in semiconductor and materials science applications. This compound serves as a valuable metal source for CVD (Chemical Vapor Deposition) and ALD (Atomic Layer Deposition) processes, enabling the deposition of highly conductive molybdenum layers. It is also widely used as a catalyst precursor in organic reactions and plays a crucial role in the synthesis of metal carbonyl complexes.
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          ABOUT US
          Fujian Wolfa Biotechnology Co., Ltd. is a global provider of high-end new materials and fine chemicals, specializing in both the trade and development of innovative products and tailored solutions across a wide range of industries.
           
          With a comprehensive product portfolio and a multidisciplinary team, we deliver a unique advantage through the seamless integration of R&D, manufacturing, and supply chain capabilities. From molecular design to formulation solutions, we go beyond product supply– offering integrated, one-stop solutions powered by our R&D capabilities and deep technical expertise to support our clients’ success at every stage.
          OUR PARTNERS
          At Fujian Wolfa Biotechnology Co., Ltd., we are continuously improving our products and services to meet the evolving needs of our clients. Since our establishment, we have strategically expanded our global presence, fostering long term collaborations with corporations across key markets and industries. Our products and services are trusted by professionals worldwide, with clients in the U.S., Japan, South Korea, Switzerland, India, and more.
           
          We look forward to continuing to grow with our clients, delivering innovative solutions that drive long-term success.
          LATEST NEWS

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          Fragrance and Flavor

          Global Flavors & Fragrances Market Maintains Steady Growth

          In recent years, the global flavor and fragrance market has maintained a steady growth trend.

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          ALD/CVD Precursors

          ALD/CVD Precursors: Key Materials Driving Advanced Manufacturing in Semiconductors, Energy, and Beyond

          ALD/CVD precursors are essential specialty chemicals used to deposit ultra-thin films in high-precision manufacturing processes such as Atomic Layer Deposition (ALD) and Chemical Vapor Deposition (CVD). These deposition techniques are widely adopted in industries like semiconductors, solar energy, LED displays, and advanced functional coatings.

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          Welcome to Our Website!

          Welcome to our website! We are delighted to have you here. Explore our offerings, discover innovative solutions, and learn more about how we can support your needs. Feel free to get in touch with us – we're here to help!

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          Welcome to Contact Us
          We’d love to hear from you. Whether you have questions about our products, need technical support, or want to explore new opportunities, our team is here to assist you. Reach out to us today, and we’ll provide the expert guidance and tailored solutions you need. 
           
          We look forward to working with you!
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