WOLFA

Chemical Formula: NiCp2

Bis(Cyclopentadienyl) Nickel, also known as NiCp2, is an organometallic compound composed of a nickel atom and two cyclopentadienyl ligands. Known for its unique molecular structure, high stability, and excellent reactivity, it is widely used in organic synthesis, metal thin film preparation, and catalysis research. It is also an important precursor in many CVD processes.

Chemical Formula: C15H21LaO6

Lanthanum(III) Acetylacetonate is an organometallic complex with excellent thermal stability and volatility, making it highly valued in thin film deposition, catalysis, and the preparation of specialty materials. Its stable structure and high purity make it an indispensable precursor material in advanced manufacturing processes.

Chemical Formula: C24H51LaN6

Lanthanum Tris(N, N'-Diisopropylacetamidinate) is a metal-organic precursor with moderate vapor pressure and good thermal stability, widely used in ALD and MOCVD processes for depositing lanthanum-based thin film materials. This compound is often cited as C24H51LaN6 and is one of the important lanthanide deposition precursors in microelectronics manufacturing.

Chemical Formula: C21H45LaN6

Tris(N,N'-Di-I-Propylformamidinato)Lanthanum(III) (C21H45LaN6) is an important lanthanide organometallic compound with key applications in advanced materials deposition. This compound is widely considered a highly efficient precursor for preparing high-quality lanthanum-based oxide thin films in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. Its excellent volatility, thermal stability, and reactivity make it highly favored in semiconductor thin film preparation.

Chemical Formula: La[N(TMS)2]3

Tris(N,N-Bis(Trimethylsilyl)Amide)Lanthanum(III) (La[N(TMS)2]3) is a highly stable and reactive organometallic compound, commonly used in efficient catalysis and organic synthesis. This compound is widely considered a highly efficient lanthanum precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, and is highly favored in the preparation of semiconductors and functional thin films.

Chemical Formula: 3C9H13.La

Tris(Tetramethylcyclopentadienyl)lanthanum (La(MeCp)3) is an important lanthanide organometallic compound, usually existing in solid form, and has wide applications in scientific research and industry. This compound is renowned for its unique sterically crowded structure and coordination properties, and is widely considered a key precursor in organic synthesis catalysis, optoelectronic materials, and materials science.

Chemical Formula: LaCp3

Tris(Cyclopentadienyl)lanthanum (LaCp3) is a white to off-white crystal widely used in catalysts, optoelectronic materials, and high-tech fields. Its excellent chemical stability and high reactivity make it important in organic synthesis and materials science, playing a crucial role in both industry and scientific research.

Chemical Formula: C12H6Mg

Bis(Methylcyclopentadienyl)Magnesium (C12H6Mg) is an important organometallic compound, typically a solid at room temperature and pressure. It is highly valued as a magnesium precursor in thin film deposition and organometallic chemical reactions due to its high reactivity and unique volatility. It also has wide applications in semiconductor doping and functional thin film fabrication.

CAS: 13499-05-3

 

Hafnium chloride is an important inorganic compound, typically appearing as a white to slightly yellow crystalline solid with high hygroscopicity. It is a key raw material in many industrial and scientific fields, widely used in semiconductor manufacturing, catalyst synthesis, and the production of high-temperature alloys. Due to its unique chemical and physical properties, HfCl₄ is considered an important high-performance material, particularly exhibiting excellent stability and reactivity in high-temperature environments.

Chemical Formula: C15H21LaO6

Lanthanum(III) Acetylacetonate is an organometallic complex with excellent thermal stability and volatility, making it highly valued in thin film deposition, catalysis, and the preparation of specialty materials. Its stable structure and high purity make it an indispensable precursor material in advanced manufacturing processes.

Chemical Formula: C24H51LaN6

Lanthanum Tris(N, N'-Diisopropylacetamidinate) is a metal-organic precursor with moderate vapor pressure and good thermal stability, widely used in ALD and MOCVD processes for depositing lanthanum-based thin film materials. This compound is often cited as C24H51LaN6 and is one of the important lanthanide deposition precursors in microelectronics manufacturing.

CAS: 151139-14-9

Chemical Formula: C21H45LaN6

Tris(N,N'-Di-I-Propylformamidinato)Lanthanum(III) (C21H45LaN6) is an important lanthanide organometallic compound with key applications in advanced materials deposition. This compound is widely considered a highly efficient precursor for preparing high-quality lanthanum-based oxide thin films in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. Its excellent volatility, thermal stability, and reactivity make it highly favored in semiconductor thin film preparation.

Chemical Formula: La[N(TMS)2]3

Tris(N,N-Bis(Trimethylsilyl)Amide)Lanthanum(III) (La[N(TMS)2]3) is a highly stable and reactive organometallic compound, commonly used in efficient catalysis and organic synthesis. This compound is widely considered a highly efficient lanthanum precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes, and is highly favored in the preparation of semiconductors and functional thin films.

Chemical Formula: LaCp3

Tris(Cyclopentadienyl)lanthanum (LaCp3) is a white to off-white crystal widely used in catalysts, optoelectronic materials, and high-tech fields. Its excellent chemical stability and high reactivity make it important in organic synthesis and materials science, playing a crucial role in both industry and scientific research.