Cobalt carbonyl (Co₂(CO)₈) is a highly reactive organometallic compound used in various catalytic and industrial applications. As a versatile metal carbonyl complex, it is particularly important in the synthesis of fine chemicals, the preparation of cobalt-based catalysts, and in the petroleum industry for hydroprocessing reactions. Cobalt carbonyl also plays a significant role in the production of cobalt alloys, where it is utilized for its metal bonding properties. In addition, it is applied in the development of high-performance coatings and in nanomaterial fabrication, owing to its unique chemical reactivity and volatility.

 

CAS:1993-09-5

 

It is a crystalline organometallic compound widely used as a tungsten precursor in thin-film deposition and as a homogeneous catalyst in chemical transformations.

 

 

Cobalt carbonyl (Co₂(CO)₈) is a highly reactive organometallic compound used in various catalytic and industrial applications. As a versatile metal carbonyl complex, it is particularly important in the synthesis of fine chemicals, the preparation of cobalt-based catalysts, and in the petroleum industry for hydroprocessing reactions. Cobalt carbonyl also plays a significant role in the production of cobalt alloys, where it is utilized for its metal bonding properties. In addition, it is applied in the development of high-performance coatings and in nanomaterial fabrication, owing to its unique chemical reactivity and volatility.

 

TDMANb is a high-purity niobium organometallic precursor widely used in Atomic Layer Deposition(ALD) and Chemical Vapor Deposition (CVD). With excellent volatility and thermal stability, it enables the growth of uniform niobium-based thin films such as niobium oxide (Nb₂O₂) and niobium nitride (NbN), which are important in semiconductors, high-k dielectrics, and advanced coatings.

 

Copper(I) thiophenolate is an organosulfur copper compound used in organic synthesis, catalysis, and coordination chemistry research. It serves as a valuable precursor for metal–sulfur bond studies, copper-based catalysts, and advanced materials research.

 

Co4(CO)12 is a cobalt carbonyl cluster compound widely used in catalysis, organometallic chemistry, and materials research. As a reactive cobalt source, it plays an important role in hydroformylation, hydrogenation, and Fischer–Tropsch-related studies, as well as in the preparation of cobalt-based catalysts and nanomaterials.

 

Chromium hexacarbonyl (Cr(CO)₆) is a versatile organometallic compound used extensively in the synthesis of pharmaceutical intermediates, fragrance compounds. High-purity chromium hexacarbonyl is also used in the repair of integrated circuit photomasks.

 

Tungsten(VI) chloride (WCl₆) is a dark violet crystalline compound that acts as a highly reactive tungsten source. It is widely used in inorganic synthesis, thin-film deposition, and advanced catalytic systems.

 

 

Hafnium chloride (HfCl₄) is a white to yellowish hygroscopic crystalline solid, widely recognized as a key precursor in high-purity hafnium compound synthesis and advanced thin-film deposition. Its strong Lewis acidity and volatility make it an essential material for semiconductor, aerospace, and catalyst industries.
 

 

It is a crystalline organometallic compound widely used as a tungsten precursor in thin-film deposition and as a homogeneous catalyst in chemical transformations.

 

 

Cobalt carbonyl (Co₂(CO)₈) is a highly reactive organometallic compound used in various catalytic and industrial applications. As a versatile metal carbonyl complex, it is particularly important in the synthesis of fine chemicals, the preparation of cobalt-based catalysts, and in the petroleum industry for hydroprocessing reactions. Cobalt carbonyl also plays a significant role in the production of cobalt alloys, where it is utilized for its metal bonding properties. In addition, it is applied in the development of high-performance coatings and in nanomaterial fabrication, owing to its unique chemical reactivity and volatility.

 

TDMANb is a high-purity niobium organometallic precursor widely used in Atomic Layer Deposition(ALD) and Chemical Vapor Deposition (CVD). With excellent volatility and thermal stability, it enables the growth of uniform niobium-based thin films such as niobium oxide (Nb₂O₂) and niobium nitride (NbN), which are important in semiconductors, high-k dielectrics, and advanced coatings.

 

Chromium hexacarbonyl (Cr(CO)₆) is a versatile organometallic compound used extensively in the synthesis of pharmaceutical intermediates, fragrance compounds. High-purity chromium hexacarbonyl is also used in the repair of integrated circuit photomasks.

 

Tungsten(VI) chloride (WCl₆) is a dark violet crystalline compound that acts as a highly reactive tungsten source. It is widely used in inorganic synthesis, thin-film deposition, and advanced catalytic systems.