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| Synonyms | Lanthanum bis(trimethylsilyl)amide;Tris[N,N-bis(trimethylsilyl)amide]lanthanum(III),97%;Tris[bis(trimethylsilyl)amido]lanthanum;TRIS[N,N-BIS(TRIMETHYLSILYL)AMIDO]LANTHANUM |
| Molecular Formula | C18H54LaN3Si6 |
| Molecular Weight | 620.06 |
| Melting Point | 149-153 °C(lit.) |
| Boiling Point | 100-2°C |
| Flash Point | 36 °F |
| Purity | ≧ 98% |
| Package Information | 100g, 500g, 1kg or customized |
Tris(N,N-bis(trimethylsilyl)amide)lanthanum(III) exhibits extremely high reactivity in catalytic reactions due to its ligand structure, effectively promoting a variety of chemical reactions, especially in organic synthesis and polymerization.
This compound exhibits excellent chemical stability, maintaining long-term stability in complex chemical environments and adapting to harsh reaction conditions.
La[N(TMS)2]3 has high melting and boiling points, which allows it to maintain its activity in high-temperature reactions, making it suitable for thermocatalytic processes.
It has good solubility in most organic solvents, making it easy to use in combination with other chemicals and improving reaction efficiency.
It is commonly used in the synthesis of catalysts, and is particularly suitable for organic synthesis reactions, such as olefin polymerization, aromatic hydrocarbon synthesis, and the catalytic process of certain specific chemical reactions.
La[N(TMS)2]3 is used as a catalyst in polymer synthesis, especially in polymerization reactions, where it can increase reaction rates and improve polymer properties.
This compound has wide applications in the semiconductor and optoelectronic fields, especially in the manufacturing process of electronic devices, where it can provide stable electrical properties.
Tris(N,N-bis(trimethylsilyl)amide)lanthanum(III) is highly sensitive to air and moisture and may decompose rapidly upon contact.
All operations (including weighing, transfer, and reaction) must be carried out under strictly anhydrous and oxygen-free conditions, such as in a glove box filled with inert gases (such as argon or nitrogen) or using the Schlenk line technique.
This product should be stored in a dry, cool place, avoiding exposure to moisture and high temperatures. Ensure the container is sealed to maintain its stability and purity over a long period.
Although the compound has good thermal stability, it should still be handled within an appropriate temperature range to avoid decomposition due to excessively high temperatures.
Direct contact with skin or eyes may cause irritation or burns. Appropriate personal protective equipment, including chemical-resistant gloves, protective clothing, safety glasses, or a face shield, must be worn during handling. In case of accidental contact, immediately flush with plenty of water and seek medical attention.
This compound should be kept away from strong acids or bases to avoid chemical reactions or decomposition.
1. What are the main uses of tris(N,N-bis(trimethylsilyl)amide)lanthanum(III)?
It is mainly used as a lanthanum precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to prepare high-quality lanthanum-containing functional thin films in semiconductors, microelectronics, and optical devices.
2. How does La[N(TMS)2]3 perform in catalytic reactions?
It exhibits extremely high reactivity, making it particularly suitable for reactions such as organic synthesis and olefin polymerization, and can significantly improve catalytic efficiency.
Wolfa professionally supplies Tris(N,N-Bis(Trimethylsilyl)Amide) Lanthanum(III), supporting small-batch sampling and large-volume procurement needs. Packaging options include ordinary glass bottles, glass ampoules, metal ampoules, etc.
For product analysis reports (such as COA) or procurement consulting, please feel free to contact us at jomin@wolfabio.com at any time.
| Synonyms | Lanthanum bis(trimethylsilyl)amide;Tris[N,N-bis(trimethylsilyl)amide]lanthanum(III),97%;Tris[bis(trimethylsilyl)amido]lanthanum;TRIS[N,N-BIS(TRIMETHYLSILYL)AMIDO]LANTHANUM |
| Molecular Formula | C18H54LaN3Si6 |
| Molecular Weight | 620.06 |
| Melting Point | 149-153 °C(lit.) |
| Boiling Point | 100-2°C |
| Flash Point | 36 °F |
| Purity | ≧ 98% |
| Package Information | 100g, 500g, 1kg or customized |
Tris(N,N-bis(trimethylsilyl)amide)lanthanum(III) exhibits extremely high reactivity in catalytic reactions due to its ligand structure, effectively promoting a variety of chemical reactions, especially in organic synthesis and polymerization.
This compound exhibits excellent chemical stability, maintaining long-term stability in complex chemical environments and adapting to harsh reaction conditions.
La[N(TMS)2]3 has high melting and boiling points, which allows it to maintain its activity in high-temperature reactions, making it suitable for thermocatalytic processes.
It has good solubility in most organic solvents, making it easy to use in combination with other chemicals and improving reaction efficiency.
It is commonly used in the synthesis of catalysts, and is particularly suitable for organic synthesis reactions, such as olefin polymerization, aromatic hydrocarbon synthesis, and the catalytic process of certain specific chemical reactions.
La[N(TMS)2]3 is used as a catalyst in polymer synthesis, especially in polymerization reactions, where it can increase reaction rates and improve polymer properties.
This compound has wide applications in the semiconductor and optoelectronic fields, especially in the manufacturing process of electronic devices, where it can provide stable electrical properties.
Tris(N,N-bis(trimethylsilyl)amide)lanthanum(III) is highly sensitive to air and moisture and may decompose rapidly upon contact.
All operations (including weighing, transfer, and reaction) must be carried out under strictly anhydrous and oxygen-free conditions, such as in a glove box filled with inert gases (such as argon or nitrogen) or using the Schlenk line technique.
This product should be stored in a dry, cool place, avoiding exposure to moisture and high temperatures. Ensure the container is sealed to maintain its stability and purity over a long period.
Although the compound has good thermal stability, it should still be handled within an appropriate temperature range to avoid decomposition due to excessively high temperatures.
Direct contact with skin or eyes may cause irritation or burns. Appropriate personal protective equipment, including chemical-resistant gloves, protective clothing, safety glasses, or a face shield, must be worn during handling. In case of accidental contact, immediately flush with plenty of water and seek medical attention.
This compound should be kept away from strong acids or bases to avoid chemical reactions or decomposition.
1. What are the main uses of tris(N,N-bis(trimethylsilyl)amide)lanthanum(III)?
It is mainly used as a lanthanum precursor in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes to prepare high-quality lanthanum-containing functional thin films in semiconductors, microelectronics, and optical devices.
2. How does La[N(TMS)2]3 perform in catalytic reactions?
It exhibits extremely high reactivity, making it particularly suitable for reactions such as organic synthesis and olefin polymerization, and can significantly improve catalytic efficiency.
Wolfa professionally supplies Tris(N,N-Bis(Trimethylsilyl)Amide) Lanthanum(III), supporting small-batch sampling and large-volume procurement needs. Packaging options include ordinary glass bottles, glass ampoules, metal ampoules, etc.
For product analysis reports (such as COA) or procurement consulting, please feel free to contact us at jomin@wolfabio.com at any time.
