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Tris(N,N'-Di-I-Propylformamidinato) Lanthanum(III)

CAS: 1034537-36-4
Chemical Formula: C21H45LaN6

Tris(N,N'-Di-I-Propylformamidinato)Lanthanum(III) (C21H45LaN6) is an important lanthanide organometallic compound with key applications in advanced materials deposition. This compound is widely considered a highly efficient precursor for preparing high-quality lanthanum-based oxide thin films in chemical vapor deposition (CVD) and atomic layer deposition (ALD) processes. Its excellent volatility, thermal stability, and reactivity make it highly favored in semiconductor thin film preparation.
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Tris(N,N'-Di-I-Propylformamidinato) Lanthanum(III) Basic Properties

SynonymsTris(N,N'-di-i-propyL;Tris(N,N''-di-i-propylformamidinato)lanthanum(III);Tris(N,N'-di-i-propylformamidinato)lanthanum(III);Tris(N,N'-di-i-propylformamidinato)lanthanum(III);
Molecular FormulaC21H45LaN6
AppearanceWhite to off-white powder
Molecular Weight520.5277
SolubilitySoluble in common organic solvents, insoluble in water
Purity≧ 98%
Package Information100g, 500g, 1kg or customized

Tris(N,N'-Di-I-Propylformamidinato) Lanthanum(III) Key Features

High volatility and thermal stability

Tris(N,N'-di-i-propylformamidinato)lanthanum(III) has sufficient vapor pressure to ensure efficient and stable transport in ALD/CVD processes, and its thermal stability ensures the purity and uniformity of the film.

Stable ligand structure

The formamidinium ligand in this compound imparts good structural stability, which helps stabilize the lanthanum center and results in faster nucleation rate and shorter nucleation delay on the substrate.

Suitable for low-temperature deposition requirements

Compared to other lanthanide precursors, this product can be deposited at lower temperatures, reducing thermal damage to the substrate and improving equipment compatibility.

Ideal precursor

As a single-source precursor, C21H45LaN6 is widely used to deposit high-quality La2O3 thin films, as well as complex lanthanum-based rare earth oxide thin films such as LaLuO3 and LaYO3, providing key materials for next-generation high-performance devices.

Tris(N,N'-Di-I-Propylformamidinato) Lanthanum(III) Main Applications

Microelectronics and semiconductor manufacturing

It is a lanthanum-based material that can be used to prepare insulating, barrier, or functional layers, and is particularly suitable for processes in advanced device structures where the uniformity and purity of thin films are extremely high.

Optical materials

Tris(N,N'-di-i-propylformamidinato)lanthanum(III) can be used to deposit rare earth-doped thin films or oxides with specific optical properties, suitable for fields such as optical communication and solid-state lighting.

Catalysts

C21H45LaN6, as an active organometallic reagent, can serve as an organic precursor for homogeneous or heterogeneous catalysts in organic synthesis reactions such as hydrogenation, carbonylation, or polymerization.

Precautions

  1. Tris(N,N'-di-i-propylformamidinato)lanthanum(III) is extremely sensitive to air and moisture. Exposure to the atmosphere can lead to rapid decomposition or hydrolysis. Therefore, it must be handled in a glove box or vacuum/inert gas system under a high-purity nitrogen or argon atmosphere.

  2. The product should be stored in a sealed, light-proof container and kept at a low temperature to extend its shelf life. It should be stored away from strong oxidizing chemicals, acids, and alkalis.

  3. Operators must wear complete personal protective equipment, including chemical-resistant gloves, safety glasses, and lab coats, to ensure that the eyes, skin, and respiratory tract do not come into contact with the equipment.

  4. If the substance comes into contact with skin, immediately wash the affected area with plenty of soap and water and remove contaminated clothing. If inhaled, move the patient to fresh air immediately. If irritation persists or the substance comes into contact with the eyes, seek immediate medical attention.

  5. All waste must be classified and treated in accordance with local and national regulations on the disposal of organic metal waste, and must not be discharged into the environment indiscriminately to prevent long-term adverse effects on soil and water bodies.

FAQ

1. Is a cold chain required during transportation?

Dry ice or cryogenic solid transport is usually required to ensure the compound is protected from heat and moisture, thus guaranteeing its stability and purity.


2. What impact does the purity of C21H45LaN6 have on the final film quality?

Purity is a key factor determining the electrical performance of high-k thin films. Its high purity ensures that the deposited La2O3 or other lanthanum-based oxide films contain very few impurity atoms (such as Fe, K, and Na). These impurities act as trap centers, leading to increased leakage current and dielectric loss in high-k dielectric films, severely impacting device reliability and lifespan.


Wolfa professionally supplies Tris(N,N'-Di-I-Propylformamidinato) Lanthanum(III), supporting small-batch sampling and large-volume procurement needs. Packaging options include ordinary glass bottles, glass ampoules, metal ampoules, etc.


For product analysis reports (such as COA) or procurement consulting, please feel free to contact us at jomin@wolfabio.com at any time.

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