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Molecular Formula: C20H33Nb
Appearance: Light brown powder
Molecular Weight: 366.39
Sensibility: Air sensitive
Trihydridobis(Pentamethylcyclopentadienyl)Niobium(V) undergoes rigorous purification, maintaining its molecular structure stable even in high-temperature environments. This makes it suitable for precision thin-film manufacturing processes, ensuring consistent material properties.
As a niobium source precursor for CVD and ALD, Nb[(CH3)5C5]2H3 exhibits moderate volatility and decomposition temperature, enabling uniform deposition and controllable film thickness.
The ligand structure enables high controllability during the deposition process, minimal byproducts, and a simple reaction pathway, facilitating the preparation of high-quality niobium thin films.
Suitable for a variety of substrates and material systems, it can be combined with other metal-organic precursors to fabricate composite thin films or multilayer structures.
Due to its advantages in conductivity and corrosion resistance, niobium is often used in the manufacture of thin film materials for capacitors, integrated circuits, and resistors.
Trihydridobis(pentamethylcyclopentadienyl)niobium(V) is an important precursor for the preparation of metallic niobium and niobium oxide thin films, and is widely used in semiconductor processing, superconducting materials, and nano-coatings.
Nb[(CH3)5C5]2H3 is often used to synthesize novel niobium-based catalysts or polymer composites, promoting research on chemical transformations and structural regulation.
This compound is commonly used in research on high-energy materials, surface science, and organometallic chemistry, and is an important model substance for exploring the mechanisms of transition metal reactions.
The compound should be stored in a sealed container under the protection of an inert gas (such as nitrogen or argon) and avoid direct sunlight and high temperature environment.
Operations should be carried out in a dry box or glove box to avoid decomposition. The system and container must be fully leak-tested and purged with inert gas before use.
It is strictly forbidden to contact or mix with oxidants, water, alcohols, any compounds containing active hydrogen or any proton sources.
During transportation, it must be packed in pressure-resistant containers sealed with inert gas to prevent shock, moisture and violent collision.
When discarding, it should follow the organic metal waste treatment regulations and avoid mixing with oxidizing or strongly acidic substances.
1. Can Trihydridobis(Pentamethylcyclopentadienyl)Niobium(V) be used in air?
Not recommended. This compound reacts strongly with oxygen and moisture in air and should be handled under an inert atmosphere (such as argon).
2. Is it suitable for ALD deposition?
Yes, Nb[(CH3)5C5]2H3 is a commonly used ALD niobium source precursor for depositing high-purity niobium or niobium oxide thin films.
3. When using Nb[(CH3)5C5]2H3 as a catalyst, what reaction conditions should be considered?
Key considerations include a strictly anhydrous and oxygen-free environment and solvent selection. The reaction must be conducted under an inert atmosphere in an aprotic solvent (such as toluene, benzene, or n-hexane) that has been thoroughly dried and degassed before use. Temperature control is also crucial; many catalytic reactions proceed at room temperature or with mild heating. Furthermore, it's important to note that Nb[(CH3)5C5]2H3 may simply be a precursor of the catalytically active species; the actual catalyst may be a niobium hydride or niobium alkyl species generated under the reaction conditions.
For more information or to purchase Trihydridobis(Pentamethylcyclopentadienyl)Niobium(V)(Nb[(CH3)5C5]2H3), please feel free to contact us via email or WhatsApp.
Molecular Formula: C20H33Nb
Appearance: Light brown powder
Molecular Weight: 366.39
Sensibility: Air sensitive
Trihydridobis(Pentamethylcyclopentadienyl)Niobium(V) undergoes rigorous purification, maintaining its molecular structure stable even in high-temperature environments. This makes it suitable for precision thin-film manufacturing processes, ensuring consistent material properties.
As a niobium source precursor for CVD and ALD, Nb[(CH3)5C5]2H3 exhibits moderate volatility and decomposition temperature, enabling uniform deposition and controllable film thickness.
The ligand structure enables high controllability during the deposition process, minimal byproducts, and a simple reaction pathway, facilitating the preparation of high-quality niobium thin films.
Suitable for a variety of substrates and material systems, it can be combined with other metal-organic precursors to fabricate composite thin films or multilayer structures.
Due to its advantages in conductivity and corrosion resistance, niobium is often used in the manufacture of thin film materials for capacitors, integrated circuits, and resistors.
Trihydridobis(pentamethylcyclopentadienyl)niobium(V) is an important precursor for the preparation of metallic niobium and niobium oxide thin films, and is widely used in semiconductor processing, superconducting materials, and nano-coatings.
Nb[(CH3)5C5]2H3 is often used to synthesize novel niobium-based catalysts or polymer composites, promoting research on chemical transformations and structural regulation.
This compound is commonly used in research on high-energy materials, surface science, and organometallic chemistry, and is an important model substance for exploring the mechanisms of transition metal reactions.
The compound should be stored in a sealed container under the protection of an inert gas (such as nitrogen or argon) and avoid direct sunlight and high temperature environment.
Operations should be carried out in a dry box or glove box to avoid decomposition. The system and container must be fully leak-tested and purged with inert gas before use.
It is strictly forbidden to contact or mix with oxidants, water, alcohols, any compounds containing active hydrogen or any proton sources.
During transportation, it must be packed in pressure-resistant containers sealed with inert gas to prevent shock, moisture and violent collision.
When discarding, it should follow the organic metal waste treatment regulations and avoid mixing with oxidizing or strongly acidic substances.
1. Can Trihydridobis(Pentamethylcyclopentadienyl)Niobium(V) be used in air?
Not recommended. This compound reacts strongly with oxygen and moisture in air and should be handled under an inert atmosphere (such as argon).
2. Is it suitable for ALD deposition?
Yes, Nb[(CH3)5C5]2H3 is a commonly used ALD niobium source precursor for depositing high-purity niobium or niobium oxide thin films.
3. When using Nb[(CH3)5C5]2H3 as a catalyst, what reaction conditions should be considered?
Key considerations include a strictly anhydrous and oxygen-free environment and solvent selection. The reaction must be conducted under an inert atmosphere in an aprotic solvent (such as toluene, benzene, or n-hexane) that has been thoroughly dried and degassed before use. Temperature control is also crucial; many catalytic reactions proceed at room temperature or with mild heating. Furthermore, it's important to note that Nb[(CH3)5C5]2H3 may simply be a precursor of the catalytically active species; the actual catalyst may be a niobium hydride or niobium alkyl species generated under the reaction conditions.
For more information or to purchase Trihydridobis(Pentamethylcyclopentadienyl)Niobium(V)(Nb[(CH3)5C5]2H3), please feel free to contact us via email or WhatsApp.
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