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Bis(2,2,6,6-Tetramethyl-3,5-Heptanedionato) Magnesiumdihydrate

CAS: 21361-35-3
Chemical Formula: C22H38MgO4

Bis(2,2,6,6-Tetramethyl-3,5-Heptanedionato) Magnesium Dihydrate (C22H38MgO4) is a white powder. It is structurally stable, has low volatility, and is easy to process, making it highly valuable for applications in thin film deposition, chemical vapor deposition, and the preparation of functional materials.
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Bis(2,2,6,6-Tetramethyl-3,5-Heptanedionato) Magnesium Dihydrate Basic Properties

SynonymsMG(TMHD)2;MG(TMHD)2 DIHYDRATE;BIS(2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATO)MAGNESIUM(II);MAGNESIUM (2,2,6,6-TETRAMETHYL-3,5-HEPTANEDIONATE)
Molecular FormulaC22H38MgO4
AppearanceWhite powder
Molecular Weight390.84
Melting Point135-150°C
Boiling Point150°C 0,05mm
Flash Point150°C/0.05mm subl.
SolubilityEasily soluble in organic solvents
Purity≧ 98%
Package Information100g, 500g, 1kg or customized

Bis(2,2,6,6-Tetramethyl-3,5-Heptanedionato) Magnesium Dihydrate Key Features

High-performance precursor

As a high-quality magnesium source, it exhibits stable evaporation characteristics in processes such as CVD/ALD, enabling the formation of magnesium-based thin films with specific functions, making it suitable for thin film deposition and coating technologies.

High adaptability

The structure of C22H38MgO4 makes it easy to operate under anhydrous and low-water conditions and suitable for various deposition methods such as solvent deposition and vapor deposition.

Excellent thermal stability

This compound exhibits excellent thermal stability and vapor pressure during material synthesis and thin film deposition, which is beneficial for obtaining uniform, high-quality coatings through vapor phase transport.

Wide range of applications

It can be used not only for thin film deposition, but also for magnesium-doped oxides, optoelectronic materials, and catalyst supports.

Bis(2,2,6,6-Tetramethyl-3,5-Heptanedionato) Magnesium Dihydrate Main Applications

Thin film deposition

Used in metal-organic chemical vapor deposition or atomic layer deposition processes to prepare magnesium-based thin films or magnesium-doped oxide thin films.

Catalysis

C22H38MgO4 can be used as a catalyst or its precursor in specific organic synthesis reactions.

Electronic materials

In display devices and sensors, magnesium-based ligands can serve as doping sources or auxiliary carriers, thereby enhancing the optical and electrical properties of the materials.

New material preparation

Used for the synthesis of various magnesium-based nanomaterials, advanced ceramics, or functional composite materials, which have potential applications in catalysts and specialty materials.

Precautions

  1. C22H38MgO4 should be stored in a dry, cool environment, avoiding the intrusion of humid air and moisture to prevent hydrolysis or deterioration.

  2. The operation must be carried out in a fume hood, and appropriate goggles, gloves and protective clothing must be worn.

  3. Avoid contact with strong acids, strong oxidants, or humid air to prevent the release of volatiles.

  4. It is recommended to comply with chemical transport regulations during transportation and avoid exposure to high temperatures, strong vibrations, or impacts.

FAQ

1. Are special solvents or conditions required for use?

Usually, it is best to use under anhydrous or low-water conditions. It is recommended to use dry organic solvents and operate in an inert gas environment to prevent moisture from affecting deposition or decomposition.


2. What are the main uses of C22H38MgO4?

This compound is mainly used as a precursor for magnesium-based metal-organic complexes and is widely used in thin film deposition, catalysts, and functional materials.


Wolfa professionally supplies Bis(2,2,6,6-Tetramethyl-3,5-Heptanedionato) Magnesium Dihydrate, supporting small-batch sampling and large-volume procurement needs. Packaging options include ordinary glass bottles, glass ampoules, metal ampoules, etc.


For product analysis reports (such as COA) or procurement consulting, please feel free to contact us at jomin@wolfabio.com at any time.

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