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Name: Tungsten(V) hexachloride
MF: WCl5
CAS: 13470-14-9
MP: 242 ℃
BP: 297.19 ℃
Density: 3.875
Solubility: React with H2O
Clolor: Black crystals
Water solubility: Decomposes in H2O to a blue oxide
Semiconductor Thin-Film Deposition (CVD/ALD):
Used for depositing tungsten metal layers in advanced logic and memory devices due to its higher volatility than WCl₆.
Catalytic Applications:
Functions as a Lewis acid in selective alkylation and other organic transformations.
Precursor in Coordination Chemistry:
Converts into lower-valent tungsten complexes or organometallic reagents for synthesis.
Specialty Materials Production:
Suitable for manufacturing high-purity tungsten compounds and doped materials for electronics.
Custom packaging for R&D or production scale.
If you have any inquiries, feel free to reach out to us via the email or WhatsApp.
Name: Tungsten(V) hexachloride
MF: WCl5
CAS: 13470-14-9
MP: 242 ℃
BP: 297.19 ℃
Density: 3.875
Solubility: React with H2O
Clolor: Black crystals
Water solubility: Decomposes in H2O to a blue oxide
Semiconductor Thin-Film Deposition (CVD/ALD):
Used for depositing tungsten metal layers in advanced logic and memory devices due to its higher volatility than WCl₆.
Catalytic Applications:
Functions as a Lewis acid in selective alkylation and other organic transformations.
Precursor in Coordination Chemistry:
Converts into lower-valent tungsten complexes or organometallic reagents for synthesis.
Specialty Materials Production:
Suitable for manufacturing high-purity tungsten compounds and doped materials for electronics.
Custom packaging for R&D or production scale.
If you have any inquiries, feel free to reach out to us via the email or WhatsApp.
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